Coating apparatus – Gas or vapor deposition
Reexamination Certificate
2007-04-17
2007-04-17
Zervigon, Rudy (Department: 1763)
Coating apparatus
Gas or vapor deposition
C156S345290
Reexamination Certificate
active
10712690
ABSTRACT:
A method and apparatus for performing multiple deposition processes is provided. In one embodiment, the apparatus includes a chamber body and a gas distribution assembly disposed on the chamber body. In one embodiment, the method comprises positioning a substrate surface to be processed within a chamber body, delivering two or more compounds into the chamber body utilizing a gas distribution assembly disposed on the chamber body to deposit a film comprising a first material, and then delivering two or more compounds into the chamber body utilizing a gas distribution assembly disposed on the chamber body to deposit a film comprising a second material. In one aspect of these embodiments, the gas distribution assembly includes a gas conduit in fluid communication with the chamber body, two or more isolated gas inlets equipped with one or more high speed actuating valves in fluid communication with the gas conduit, and a mixing channel in fluid communication with the gas conduit. The valves are adapted to alternately pulse one or more compounds into the gas conduit, and the mixing channel is adapted to deliver a continuous flow of one or more compounds into the gas conduit.
REFERENCES:
patent: 4058430 (1977-11-01), Suntola et al.
patent: 4389973 (1983-06-01), Suntola et al.
patent: 4413022 (1983-11-01), Suntola et al.
patent: 4415275 (1983-11-01), Dietrich
patent: 4761269 (1988-08-01), Conger et al.
patent: 4834831 (1989-05-01), Nishizawa et al.
patent: 4975252 (1990-12-01), Nishizawa et al.
patent: 4993357 (1991-02-01), Scholz
patent: 5027746 (1991-07-01), Frijlink
patent: 5173327 (1992-12-01), Sandhu et al.
patent: 5225366 (1993-07-01), Yoder
patent: 5261959 (1993-11-01), Gasworth
patent: 5281274 (1994-01-01), Yoder
patent: 5294286 (1994-03-01), Nishizawa et al.
patent: 5338362 (1994-08-01), Imahashi
patent: 5374570 (1994-12-01), Nasu et al.
patent: 5441703 (1995-08-01), Jurgensen
patent: 5443647 (1995-08-01), Aucoin et al.
patent: 5480818 (1996-01-01), Matsumoto et al.
patent: 5483919 (1996-01-01), Yokoyama et al.
patent: 5503875 (1996-04-01), Imai et al.
patent: 5674786 (1997-10-01), Turner et al.
patent: 5711811 (1998-01-01), Suntola et al.
patent: 5728223 (1998-03-01), Murakami et al.
patent: 5730802 (1998-03-01), Ishizumi et al.
patent: 5796116 (1998-08-01), Nakata et al.
patent: 5807792 (1998-09-01), Ilg et al.
patent: 5835677 (1998-11-01), Li et al.
patent: 5855680 (1999-01-01), Soininen et al.
patent: 5879459 (1999-03-01), Gadgli et al.
patent: 5916365 (1999-06-01), Sherman
patent: 5923056 (1999-07-01), Lee et al.
patent: 5972430 (1999-10-01), DiMeo, Jr. et al.
patent: 6015590 (2000-01-01), Suntola et al.
patent: 6015917 (2000-01-01), Bhandari et al.
patent: 6042652 (2000-03-01), Hyun et al.
patent: 6071572 (2000-06-01), Mosely et al.
patent: 6084302 (2000-07-01), Sandhu
patent: 6124158 (2000-09-01), Dautartas et al.
patent: 6139700 (2000-10-01), Kang et al.
patent: 6144060 (2000-11-01), Park et al.
patent: 6174377 (2001-01-01), Doering et al.
patent: 6174809 (2001-01-01), Kang et al.
patent: 6183563 (2001-02-01), Choi et al.
patent: 6197683 (2001-03-01), Kang et al.
patent: 6200893 (2001-03-01), Sneh
patent: 6203613 (2001-03-01), Gates et al.
patent: 6207487 (2001-03-01), Kim et al.
patent: 6231672 (2001-05-01), Choi et al.
patent: 6270572 (2001-08-01), Kim et al.
patent: 6284646 (2001-09-01), Leem
patent: 6287965 (2001-09-01), Kang et al.
patent: 6302965 (2001-10-01), Umotoy et al.
patent: 6305314 (2001-10-01), Sneh et al.
patent: 6306216 (2001-10-01), Kim et al.
patent: 6342277 (2002-01-01), Sherman
patent: 6348376 (2002-02-01), Lim et al.
patent: 6358829 (2002-03-01), Yoon et al.
patent: 6372598 (2002-04-01), Kang et al.
patent: 6379748 (2002-04-01), Bhandari et al.
patent: 6391785 (2002-05-01), Satta et al.
patent: 6399491 (2002-06-01), Jeon et al.
patent: 6416577 (2002-07-01), Suntoloa et al.
patent: 6416822 (2002-07-01), Chiang et al.
patent: 6447607 (2002-09-01), Soininen et al.
patent: 6451119 (2002-09-01), Sneh et al.
patent: 6451695 (2002-09-01), Sneh
patent: 6468924 (2002-10-01), Lee et al.
patent: 6475276 (2002-11-01), Elers et al.
patent: 6475910 (2002-11-01), Sneh
patent: 6478872 (2002-11-01), Chae et al.
patent: 6481945 (2002-11-01), Hasper et al.
patent: 6482262 (2002-11-01), Elers et al.
patent: 6482733 (2002-11-01), Raaijmakers et al.
patent: 6511539 (2003-01-01), Raaijmakers
patent: 6551406 (2003-04-01), Kilpi
patent: 6569501 (2003-05-01), Chiang et al.
patent: 6572705 (2003-06-01), Suntola et al.
patent: 6578287 (2003-06-01), Aswald
patent: 6579372 (2003-06-01), Park
patent: 6585823 (2003-07-01), Van Wijck
patent: 6593484 (2003-07-01), Yasuhara et al.
patent: 6596602 (2003-07-01), Iizuka et al.
patent: 6607976 (2003-08-01), Chen et al.
patent: 6620723 (2003-09-01), Byun et al.
patent: 6630030 (2003-10-01), Suntola et al.
patent: 6630201 (2003-10-01), Chiang et al.
patent: 6632279 (2003-10-01), Ritala et al.
patent: 6660126 (2003-12-01), Nguyen et al.
patent: 6716287 (2004-04-01), Santiago et al.
patent: 6716302 (2004-04-01), Carducci et al.
patent: 6718126 (2004-04-01), Lei
patent: 6734020 (2004-05-01), Lu et al.
patent: 6772072 (2004-08-01), Ganguli et al.
patent: 6773507 (2004-08-01), Jallepally et al.
patent: 6777352 (2004-08-01), Tepman et al.
patent: 6778762 (2004-08-01), Shareef et al.
patent: 6815285 (2004-11-01), Choi et al.
patent: 6818094 (2004-11-01), Yudovsky
patent: 6821563 (2004-11-01), Yudovsky
patent: 6866746 (2005-03-01), Lei et al.
patent: 6868859 (2005-03-01), Yudovsky
patent: 6919398 (2005-07-01), Born et al.
patent: 2001/0000866 (2001-05-01), Sneh et al.
patent: 2001/0002280 (2001-05-01), Sneh
patent: 2001/0009140 (2001-07-01), Bondestam et al.
patent: 2001/0009695 (2001-07-01), Saanila et al.
patent: 2001/0011526 (2001-08-01), Doering et al.
patent: 2001/0013312 (2001-08-01), Soininen et al.
patent: 2001/0014371 (2001-08-01), Kilpi
patent: 2001/0024387 (2001-09-01), Raaijmakers et al.
patent: 2001/0025979 (2001-10-01), Kim et al.
patent: 2001/0028924 (2001-10-01), Sherman
patent: 2001/0034123 (2001-10-01), Jeon et al.
patent: 2001/0041250 (2001-11-01), Werkhoven et al.
patent: 2001/0042523 (2001-11-01), Kesala
patent: 2001/0042799 (2001-11-01), Kim et al.
patent: 2001/0054377 (2001-12-01), Lindfors et al.
patent: 2001/0054730 (2001-12-01), Kim et al.
patent: 2001/0054769 (2001-12-01), Raaijmakers et al.
patent: 2002/0000196 (2002-01-01), Park
patent: 2002/0000598 (2002-01-01), Kang et al.
patent: 2002/0007790 (2002-01-01), Park
patent: 2002/0009544 (2002-01-01), McFeely et al.
patent: 2002/0009896 (2002-01-01), Sanhu et al.
patent: 2002/0017242 (2002-02-01), Hamaguchi et al.
patent: 2002/0020869 (2002-02-01), Park et al.
patent: 2002/0021544 (2002-02-01), Cho et al.
patent: 2002/0031618 (2002-03-01), Sherman
patent: 2002/0041931 (2002-04-01), Suntola et al.
patent: 2002/0048635 (2002-04-01), Kim et al.
patent: 2002/0052097 (2002-05-01), Park
patent: 2002/0060363 (2002-05-01), Xi et al.
patent: 2002/0066411 (2002-06-01), Chiang et al.
patent: 2002/0068458 (2002-06-01), Chiang et al.
patent: 2002/0073924 (2002-06-01), Chiang et al.
patent: 2002/0076481 (2002-06-01), Chiang et al.
patent: 2002/0076507 (2002-06-01), Chiang et al.
patent: 2002/0076508 (2002-06-01), Chiang et al.
patent: 2002/0076837 (2002-06-01), Hujanen et al.
patent: 2002/0086106 (2002-07-01), Park et al.
patent: 2002/0086111 (2002-07-01), Byun et al.
patent: 2002/0086507 (2002-07-01), Park et al.
patent: 2002/0092471 (2002-07-01), Kang et al.
patent: 2002/0094689 (2002-07-01), Park
patent: 2002/0098627 (2002-07-01), Pomarede et al.
patent: 2002/0104481 (2002-08-01), Chiang et al.
patent: 2002/0106536 (2002-08-01), Lee et al.
patent: 2002/0106846 (2002-08-01), Seutter et al.
patent: 2002/0108570 (2002-08-01), Lindfors
patent: 2002/0110991 (2002-08-01), Li
patent: 2002/0115886 (2002-08-01), Yasuhara et al.
patent: 2002/0117399 (2002-08-01), Chen et al.
patent: 2002/0121241 (2002-09-01), Nguyen et al.
patent: 2002/0121342 (2002-09-01), Nguyen et al.
patent: 2002/0127745 (2002-09-01), Lu et al.
patent: 2002/0134307 (2002-09-01), Choi
patent: 2002/0144655 (2002-10-01)
Chang Mei
Chen Ling
Chung Hua
Ku Vincent W.
Wu Dien-Yeh
Applied Materials Inc.
Patterson & Sheridan LLP
Zervigon Rudy
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