Apparatus and method for generating plasma

Details Apparatus and method for generating plasma Apparatus and method for generating plasma

1998-03-19

2000-11-07

Phasge, Arun S.

Coating apparatus

Gas or vapor deposition

With treating means

118715, 118725, 156243, 156345, 156643, C23F 102

Patent

active

061430846

ABSTRACT:
An apparatus comprising a semiconductor processing chamber, a plasma generator, and a pipe connecting a semiconductor processing chamber and the plasma generator. The plasma generator includes a generation chamber, a radio frequency generator which generates an ion plasma within the generation chamber, and a magnetic device which confines the plasma primarily within a center region of the generation chamber.

REFERENCES:
patent: 4664747 (1987-05-01), Sekiguchi et al.
patent: 4949671 (1990-08-01), Davis et al.
patent: 5429070 (1995-07-01), Campbell et al.
patent: 5656123 (1997-08-01), Salimian et al.

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