Apparatus and method for forming thin-film

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C427S551000, C427S481000, C427S484000, C427S485000, C427S560000, C430S330000

Reexamination Certificate

active

07074548

ABSTRACT:
A method of forming a thin-film including a capability to remove contaminants from the formed thin-film and/or a substrate on which the thin-film is formed using alcohol. The method includes allowing a substrate holder to support a substract. A first mixture is produced by mixing a condensation polymer containing an element of metal oxide compound and alcohol. Then second mixture is produced by mixing supercritical fluid or liquid carbon dioxide and the first mixture. A thin film is formed by applying the second mixture on a surface of the substrate. After forming the thin-film, the substrate is cleaned by applying alcohol to upper and lower surfaces, preferably the whole upper and lower surfaces, of the substract. The thin-film is crystallized by heating, and the crystallizing may include applying oxygen in a crystallizing chamber. Soft X-rays may be applied to the substrate, during the forming of the thin-film on the surface of the substrate.

REFERENCES:
patent: 6290865 (2001-09-01), Lloyd et al.
patent: 6806183 (2004-10-01), Kang et al.
patent: 2003/0020157 (2003-01-01), Natori et al.
patent: 2003/0047533 (2003-03-01), Reid et al.
patent: 2003/0059544 (2003-03-01), Bravo-Vasquez et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Apparatus and method for forming thin-film does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus and method for forming thin-film, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus and method for forming thin-film will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3560815

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.