Apparatus and method for efficient and compact remote microwave

Coating apparatus – Gas or vapor deposition – With treating means

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118723MR, 156345, 31511121, C23C 1600

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06029602&

ABSTRACT:
An apparatus and methods for a CVD system incorporates a plasma system for efficiently generating a plasma remotely from a substrate processing zone. The remotely generated plasma may be used to clean unwanted deposits from a chamber, or may be used during substrate processing for etching or depositing processes. In a specific embodiment, the present invention provides an easily removable, conveniently handled, and relatively inexpensive microwave plasma source mounted on the lid of a deposition system. The remote microwave plasma source has a plasma reaction volume that is relatively large compared to a plasma applicator tube volume. Locating the gas inlet between the plasma reaction volume and a microwave power coupler improves the conversion efficiency of microwave energy to ionic plasma species.

REFERENCES:
patent: 4736304 (1988-04-01), Doehler
patent: 4831963 (1989-05-01), Saito et al.
patent: 4946549 (1990-08-01), Bachman et al.
patent: 5002632 (1991-03-01), Loewenstein et al.
patent: 5082517 (1992-01-01), Moslehi
patent: 5111111 (1992-05-01), Stevens et al.
patent: 5133825 (1992-07-01), Hakamata et al.
patent: 5234526 (1993-08-01), Chen et al.
patent: 5234529 (1993-08-01), Johson
patent: 5266364 (1993-11-01), Tamura et al.
patent: 5306985 (1994-04-01), Berry
patent: 5364519 (1994-11-01), Fujimura et al.
patent: 5387288 (1995-02-01), Shatas
patent: 5449434 (1995-09-01), Hooke et al.
patent: 5466991 (1995-11-01), Berry
patent: 5567241 (1996-10-01), Tsu et al.
patent: 5645644 (1997-07-01), Mabuchi et al.
patent: 5785807 (1998-07-01), Kanai et al.

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