Coating apparatus – Gas or vapor deposition – With treating means
Patent
1997-04-22
2000-02-29
Kunemund, Robert
Coating apparatus
Gas or vapor deposition
With treating means
118723MR, 156345, 31511121, C23C 1600
Patent
active
06029602&
ABSTRACT:
An apparatus and methods for a CVD system incorporates a plasma system for efficiently generating a plasma remotely from a substrate processing zone. The remotely generated plasma may be used to clean unwanted deposits from a chamber, or may be used during substrate processing for etching or depositing processes. In a specific embodiment, the present invention provides an easily removable, conveniently handled, and relatively inexpensive microwave plasma source mounted on the lid of a deposition system. The remote microwave plasma source has a plasma reaction volume that is relatively large compared to a plasma applicator tube volume. Locating the gas inlet between the plasma reaction volume and a microwave power coupler improves the conversion efficiency of microwave energy to ionic plasma species.
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Alejandro Luz
Applied Materials Inc.
Kunemund Robert
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