Apparatus and method for distributing a polishing fluid

Details Apparatus and method for distributing a polishing fluid Apparatus and method for distributing a polishing fluid

2006-05-09

2006-05-09

Ackun, Jr., Jacob K. (Department: 3723)

Abrading

Abrading process

Abradant supplying

C451S285000

Reexamination Certificate

active

07040970

ABSTRACT:
An apparatus and method for evenly distributing a polishing fluid onto a polishing pad during a chemical mechanical planarization process, wherein the polishing fluid is dispersed by way of a spray being emitted from a spray nozzle. The pattern of polishing fluid applied to the polishing pad can be modified by adjustment of geometric parameters of the spray nozzle. The apparatus is configured with actuating mechanisms for translating and rotating the spray nozzle relative to the polishing pad in order to adjust a pattern of distribution of the polishing fluid. The method of dispersing polishing fluid onto the polishing pad produces an even distribution of polishing fluid across a width of the polishing pad.

REFERENCES:
patent: 5928062 (1999-07-01), Miller et al.
patent: 2002/0173233 (2002-11-01), Griffin et al.
patent: 2003/0017706 (2003-01-01), Moore et al.
patent: 2003/0199234 (2003-10-01), Chen et al.
patent: 2004/0132386 (2004-07-01), Tanoue et al.
patent: 2005/0070212 (2005-03-01), Pham et al.

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