Apparatus and method for developing resist coated on a substrate

Details Apparatus and method for developing resist coated on a substrate Apparatus and method for developing resist coated on a substrate

1995-09-28

1997-04-29

Rutledge, D.

Photography

Fluid-treating apparatus

Fluid application to one side only of photographic medium

396627, G03D 500, G03D 302

Patent

active

056254334

ABSTRACT:
A developing apparatus comprising a spin chuck for rotating a wafer while keeping the wafer substantially horizontal with a resist-coated surface up, a nozzle for supplying developer, from above and obliquely, to the resist-coated surface of the wafer on the sign chuck, a source for supplying the developer to the nozzle, a cup arranged enclosing a peripheral portion of the wafer on the spin chuck and having a drain passage through which the developer supplied to the wafer is drained, and a belt drive mechanism for moving the nozzle in a horizontal plane to discharge the developer to the wafer in such a direction that follows the wafer rotating.

REFERENCES:
patent: 4161356 (1979-07-01), Giffin et al.
patent: 4564280 (1986-01-01), Fukuda
patent: 5159374 (1992-10-01), Groshong
patent: 5226953 (1993-07-01), Hodes et al.
patent: 5376216 (1994-12-01), Yoshioska et al.

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