Apparatus and method for conditioning a chemical mechanical poli

Details Apparatus and method for conditioning a chemical mechanical poli Apparatus and method for conditioning a chemical mechanical poli

1995-05-01

1998-07-07

Smith, James G.

Abrading

Accessory

Tool cleaner

451285, 451287, B24B 2118, B24B 3300, B24B 4726, B24B 5500

Patent

active

057759839

ABSTRACT:
A method and apparatus for conditioning a polishing pad improves the polishing characteristics of the pad by providing an embedded pattern that facilitates polishing and reduces glazing. Moreover, the present invention conditions a pad without significantly abrading the polishing surface, thereby prolonging the pad's useful life. A series of independently rotatable rollers having a knurled outer surface is used to embed a pattern of score marks in the surface of the polishing pad. Alternatively, a knurled conical roller engages a radius of the pad. The apparatus is adaptable to either manual or automated processes. The present invention is particularly useful for conditioning polishing pads used in the fabrication of semiconductor wafers.

REFERENCES:
patent: 4959928 (1990-10-01), Hartwig, Sr.
patent: 5070570 (1991-12-01), Sabo
patent: 5081051 (1992-01-01), Mattingly et al.
patent: 5154021 (1992-10-01), Bombardier et al.
patent: 5167667 (1992-12-01), Prigge et al.
patent: 5216843 (1993-06-01), Breivogel et al.

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