Apparatus and method for aligning a substrate on a support membe

Details Apparatus and method for aligning a substrate on a support membe Apparatus and method for aligning a substrate on a support membe

1998-06-12

2000-11-14

Beck, Shrive

Coating apparatus

Gas or vapor deposition

Work support

118728, C23C 1600

Patent

active

061464635

ABSTRACT:
A method and arrangement for lifting lowering and centering a substrate on a surface employs lift pins have conical tips. A capture range is provided by the conical tips to capture and center misaligned wafers. One or more of the pins are inclined in certain embodiments to enhance the alignment capability of the lift pins. The inclined lift pins, when retracting into a support member at an angle, move a supported substrate horizontally into proper alignment.

REFERENCES:
patent: 5695568 (1997-12-01), Sinha et al.
patent: 5820685 (1998-10-01), Kurihara et al.
patent: 5848670 (1998-12-01), Salzman
patent: 5860640 (1999-01-01), Marohl et al.

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