Apparatus and a method for forming a pattern using a crystal...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Electron beam imaging

Reexamination Certificate

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Details

C430S313000, C430S942000, C250S311000, C250S397000, C250S398000, C250S427000, C250S492300, C257S024000, C257S321000, C438S022000, C438S142000, C438S197000, C438S478000, C438S795000

Reexamination Certificate

active

06855481

ABSTRACT:
The present invention relates generally to an apparatus and a method for forming a pattern, and in particular, to an apparatus and a method for forming a pattern for the formation of quantum dots or wires with 1˜50 nm dimension using the atomic array of a crystalline material and to the manufacture of functional devices that have such a structure.In the present invention, the functional device means an electronic, magnetic, or optical device that can be fabricated by procedures including the formation process of quantum dots or wires.

REFERENCES:
patent: 5229320 (1993-07-01), Ugajin
patent: 6194237 (2001-02-01), Kim et al.
patent: 6376839 (2002-04-01), Hayles et al.
patent: 6424004 (2002-07-01), Kim et al.
patent: 08274298 (1996-10-01), None
patent: 11111618 (1999-04-01), None
patent: 2000173446 (2000-06-01), None

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