Antireflective composition for a deep ultraviolet photoresist

Details Antireflective composition for a deep ultraviolet photoresist Antireflective composition for a deep ultraviolet photoresist

1998-11-18

2000-09-05

Hamilton, Cynthia

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

4302711, 430325, G03F 7004

Patent

active

061140856

ABSTRACT:
The present invention relates to a novel antireflecting coating composition, where the composition comprises a polymer, thermal acid generator and a solvent composition. The invention further comprises processes for the use of such a composition in photolithography. The composition strongly absorbs radiation ranging from about 130 nm (nanometer) to about 250 nm.

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G. Czech, Microelectronic Engineering, 21, p. 51 (1993).
Proceeding SPIE, vol. 1086 p. 106, (1989).

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