Antireflective coatings with increased etch rates

Details Antireflective coatings with increased etch rates Antireflective coatings with increased etch rates

2007-02-27

2007-02-27

Ashton, Rosemary (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S325000

Reexamination Certificate

active

09932792

ABSTRACT:
The present invention provides new light absorbing compositions suitable for use as an antireflective coating (“ARC”) with an overcoated resist layer. ARCs of the invention exhibit increased etch rates in standard plasma etchants. Preferred ARCs of invention have significantly increased oxygen content relative to prior compositions.

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