Antireflective coating used in the fabrication of microcircuit s

Details Antireflective coating used in the fabrication of microcircuit s Antireflective coating used in the fabrication of microcircuit s

1998-12-04

2000-12-26

Elms, Richard

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

Having insulated gate

438639, 438700, H01L 218238

Patent

active

061658553

ABSTRACT:
An anti-reflective coating for use in microcircuit fabrication and specifically using ultraviolet photolithographic processes. A three layered anti-reflective coating is used to enhance metallization etching in the construction of microcircuits. The coating features a titanium nitride anti-reflective layer sandwiched between two titanium metal layers. The upper titanium layer protects subsequently applied deep ultraviolet photoresists from the deleterious effects of the titanium nitride anti-reflective layer. The unique character of the three layer anti-reflective coating allows the use of an efficient single chamber fabrication process to form the three layer coating.

REFERENCES:
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patent: 5317187 (1994-05-01), Hindman et al.
patent: 5360995 (1994-11-01), Graas
patent: 5582881 (1996-12-01), Besser et al.
patent: 5759916 (1998-06-01), Hsu et al.
patent: 5998300 (1999-12-01), Tabara
patent: 6008123 (1999-12-01), Kook et al.

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