Antireflective coating material for photoresists

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

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4302861, 430311, G03C 1492

Patent

active

061069957

ABSTRACT:
The present invention relates to an antireflective coating composition comprising an admixture of:

REFERENCES:
patent: 4956230 (1990-09-01), Edwards et al.
patent: 5516886 (1996-05-01), Rahman et al.
Japan Patent No. 11212264A, Sanyo Chemical, "Photosensitive composition for producing black matrix and/or fluorescent plane of colour cathode-ray tube . . . ", Aug. 6, 1999 (abstract).
Japan Patent No. 11231545A, Miyazawa et al., "Reflection preventive film forming material for resist surface"; Aug. 27, 1999 (abstract).

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