Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent
1996-09-30
1998-03-31
Baxter, Janet C.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
4302711, 430327, 430330, 430950, 524555, 525326, 526312, G03C 500, C03F 830
Patent
active
057337144
ABSTRACT:
The present invention relates to a novel antireflective coating solution and a process for its use in photolithography. The antireflective coating solution comprises a novel polymer and an organic solvent or a mixture of organic solvents, where the novel polymer comprises a unit containing a dye that absorbs from about 180 nm to about 450 nm and a unit containing a crosslinking group.
REFERENCES:
patent: 4491628 (1985-01-01), Ito et al.
patent: 4617252 (1986-10-01), Cordes, III et al.
patent: 4631328 (1986-12-01), Ringsdorf et al.
patent: 5069997 (1991-12-01), Schwalm et al.
patent: 5207952 (1993-05-01), Griffin, III
patent: 5227444 (1993-07-01), Muller et al.
patent: 5294680 (1994-03-01), Knors et al.
patent: 5350660 (1994-09-01), Urano et al.
patent: 5384378 (1995-01-01), Etzbach et al.
patent: 5472827 (1995-12-01), Ogawa et al.
patent: 5496899 (1996-03-01), Foll et al.
patent: 5525457 (1996-06-01), Nemoto et al.
patent: 5652297 (1997-07-01), McCulloch et al.
patent: 5652317 (1997-07-01), McCulloch et al.
patent: 5654376 (1997-08-01), Knors et al.
SPIE vol. 1927, Optical/Laser Microlithography, Mar. 3, 1993, pp. 275-286, "Optimization of Anti-reflection Layers for Deep UV Lithography", H.J. Dijkstra et al.
SPIE vol. 2724, Advances in Resist Technology and Processing XIII, Mar. 11, 1996, pp. 754-769, "Modeling of Bottom Anti-reflection Layers: Sensitivity to Optical Constants Photolithography", R.R. Dammel et al.
JP appln 6-128916 (Kokai 7-333855), Mitsubishi Chemical, Nishi et al, Dec. 22, 1995, trans. of claims.
Patent Abstracts of Japan, vol. 96, #5, Mar. 13, 1996, & JP 08 017711, Sony Corp., Jan. 19, 1996.
Patent Abstracts of Japan, vol. 12 #489(E-696), Dec. 21, 1988, & JP 63 202915, Oki Electric Ind. Co. Ltd., Aug. 22, 1988.
Patent Abstracts of Japan, vol. 7, #136(E-181), Jun. 14, 1983, & JP 58 051515, Fujitsu KK), Mar. 26, 1983.
Corso Anthony J.
Dammel Ralph R.
Ding Shuji
Durham Dana L.
Kang Ming
Ashton Rosemary
Baxter Janet C.
Clariant Finance (BVI) Limited
Jain Sangya
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