Antireflective coating compositions comprising photoacid generat

Details Antireflective coating compositions comprising photoacid generat Antireflective coating compositions comprising photoacid generat

1997-02-07

1999-08-17

Chu, John S.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430512, 430926, 430927, G03F 7095

Patent

active

059392363

ABSTRACT:
The invention provides new light absorbing crosslinking compositions suitable for use as an antireflective composition, particularly for deep UV applications. The antireflective compositions of the invention comprise a photoacid generator that is activated during exposure of an overcoated photoresist. Antireflective compositions of the invention can significantly reduce undesired footing of an overcoated resist relief image.

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