Alkaline developing composition and method of use to process lit

Details Alkaline developing composition and method of use to process lit Alkaline developing composition and method of use to process lit

1997-07-31

1998-12-22

Le, Hoa Van

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430302, 430320, G03F 732

Patent

active

058517359

ABSTRACT:
An alkaline developing composition for processing a lithographic printing plate includes an alkali metal silicate and at least 6 weight % of a thickener such as glycerine. The lithographic printing plate can be either positive- or negative-working, and includes negative-working thermal plates.

REFERENCES:
patent: 3615480 (1971-10-01), Lam
patent: 3650745 (1972-03-01), Hackmann et al.
patent: 4116851 (1978-09-01), Rupe et al.
patent: 4259434 (1981-03-01), Yamasue et al.
patent: 4451393 (1984-05-01), Watanabe et al.
patent: 4452731 (1984-06-01), Watanabe et al.
patent: 4452880 (1984-06-01), Seino et al.
patent: 4469776 (1984-09-01), Matsumoto et al.
patent: 4576903 (1986-03-01), Baron et al.
patent: 4592992 (1986-06-01), Hsieh et al.
patent: 4643840 (1987-02-01), Brocklehurst et al.
patent: 4822723 (1989-04-01), Dhillon
patent: 4945030 (1990-07-01), Turner et al.
patent: 5076952 (1991-12-01), Ahmed et al.
patent: 5164286 (1992-11-01), Blakeney et al.
patent: 5168032 (1992-12-01), Okamoto et al.
patent: 5229027 (1993-07-01), Ahmed
patent: 5234796 (1993-08-01), Shimura et al.
patent: 5250393 (1993-10-01), Imai et al.
patent: 5380623 (1995-01-01), Miller et al.
patent: 5462689 (1995-10-01), Choy et al.
patent: 5480762 (1996-01-01), Toyama et al.
patent: 5565419 (1996-10-01), Thomas et al.

Affiliated with

Also associated with

Rating

Alkaline developing composition and method of use to process lit does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Alkaline developing composition and method of use to process lit, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Alkaline developing composition and method of use to process lit will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2045348