Alignment apparatus for substrates

Data processing: generic control systems or specific application – Specific application – apparatus or process – Robot control

Reexamination Certificate

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Details

C700S246000, C700S258000, C700S302000, C250S491100

Reexamination Certificate

active

06901314

ABSTRACT:
An alignment apparatus for substrates comprises a first movement mechanism moving a substrate to be treated in a horizontal direction, a second movement mechanism moving the substrate in a vertical direction, a rotation mechanism rotating the substrate in a substrate plane, an illumination tool irradiating the substrate from a sidewise direction in a state where the substrate is held in a desired height position by the second movement mechanism, an image sensor picking up an image on a back surface of the substrate in an irradiated state, an edge position sensor sensing plural edge positions of the substrate from an image obtained by the image sensor, and a control computer obtaining a positional shift of the substrate based on the edge positions sensed by the edge position sensor and correcting a positional shift of the horizontal and rotation directions by the first movement and rotation mechanisms.

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patent: 5199448 (1993-04-01), Parker
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patent: 6275748 (2001-08-01), Bacchi et al.
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patent: 11-106044 (1999-04-01), None
patent: 11-150172 (1999-06-01), None
patent: 2000-182561 (2000-06-01), None
patent: 2001-253536 (2001-09-01), None

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