ALD apparatus and method

Details ALD apparatus and method ALD apparatus and method

2005-06-28

2005-06-28

Lund, Jeffrie R. (Department: 1763)

Coating apparatus

Gas or vapor deposition

C156S345290, C156S345330, C156S345340, C118S733000

Reexamination Certificate

active

06911092

ABSTRACT:
An apparatus and method for atomic layer deposition with improved efficiency of both chemical dose and purge is presented. The apparatus includes an integrated equipment and procedure for chamber maintenance.

REFERENCES:
patent: 4058430 (1977-11-01), Suntola et al.
patent: 4389973 (1983-06-01), Suntola et al.
patent: 4413022 (1983-11-01), Suntola et al.
patent: 4809950 (1989-03-01), Geiser
patent: 4854263 (1989-08-01), Chang et al.
patent: 4960488 (1990-10-01), Law et al.
patent: 4993357 (1991-02-01), Scholz
patent: 5114683 (1992-05-01), Hirase
patent: 5225366 (1993-07-01), Yoder
patent: 5281274 (1994-01-01), Yoder
patent: 5356476 (1994-10-01), Foster et al.
patent: 5483919 (1996-01-01), Yokoyama et al.
patent: 5582866 (1996-12-01), White
patent: 5685914 (1997-11-01), Hills et al.
patent: 5711811 (1998-01-01), Suntola et al.
patent: 5758680 (1998-06-01), Kaveh et al.
patent: 5834371 (1998-11-01), Ameen et al.
patent: 5849092 (1998-12-01), Xi et al.
patent: 5855680 (1999-01-01), Soininen et al.
patent: 5904800 (1999-05-01), Mautz
patent: 5914278 (1999-06-01), Boitnott et al.
patent: 5919332 (1999-07-01), Koshiishi et al.
patent: 5928426 (1999-07-01), Aitchison
patent: 6015590 (2000-01-01), Suntola et al.
patent: 6056824 (2000-05-01), Bartholomew et al.
patent: 6063198 (2000-05-01), Bang et al.
patent: 6174377 (2001-01-01), Doering et al.
patent: 6223684 (2001-05-01), Fujioka et al.
patent: 6305314 (2001-10-01), Sneh et al.
patent: 6361607 (2002-03-01), Dozoretz et al.
patent: 6432256 (2002-08-01), Raoux
patent: 6447607 (2002-09-01), Soininen et al.
patent: 6506352 (2003-01-01), Lindfors et al.
patent: 6527911 (2003-03-01), Yen et al.
patent: 6544341 (2003-04-01), Omstead et al.
patent: 6761796 (2004-07-01), Srivastava et al.
patent: 2002/0007790 (2002-01-01), Park
patent: 2002/0076508 (2002-06-01), Chiang et al.
patent: 2002/0187084 (2002-12-01), Lindfors et al.
patent: 2003/0168001 (2003-09-01), Sneh
patent: 2003/0180458 (2003-09-01), Sneh
patent: 2004/0187779 (2004-09-01), Park et al.
patent: 2004/0187780 (2004-09-01), Park et al.
patent: 2004/0200412 (2004-10-01), Frijlink
Sneh et al., “Thin film atomic layer disposition equipment for semiconductor processing”, Thin Solid Films, 2002, pp. 248-261, vol. 402, Elsevier Science B.V.

Affiliated with

Also associated with

Rating

ALD apparatus and method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with ALD apparatus and method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and ALD apparatus and method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3489476