Advanced low cost high throughput processing platform

Material or article handling – Apparatus for moving material between zones having different...

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C414S935000, C414S939000

Reexamination Certificate

active

07658586

ABSTRACT:
A wafer processing system and method in which a wafer, having a diameter, is movable between a loadlock and a processing chamber. A transfer chamber is arranged for selective pressure communication with the loadlock and the processing chamber. The transfer chamber having a configuration of lateral extents such that the wafer is movable through the transfer chamber between the loadlock and processing chamber along a wafer transfer path and the configuration of lateral extents causes the wafer, having the wafer diameter and moving along the wafer transfer path, to interfere with at least one of the loadlock and the processing chamber for any position along the wafer transfer path. The wafer includes a center and the wafer transfer path cab be defined by movement of the center through the transfer chamber. Swing arms are described that can independently move by different angles in opposing directions from a home position.

REFERENCES:
patent: 3125232 (1964-03-01), Brinkman et al.
patent: 4373988 (1983-02-01), Buaser et al.
patent: 4687542 (1987-08-01), Davis et al.
patent: 4836733 (1989-06-01), Hertel et al.
patent: 4885946 (1989-12-01), Balter
patent: 4927484 (1990-05-01), Mitomi
patent: 5011366 (1991-04-01), Miller
patent: 5584647 (1996-12-01), Uehara et al.
patent: 5713717 (1998-02-01), Cho
patent: 5765444 (1998-06-01), Bacchi et al.
patent: 5944857 (1999-08-01), Edwards et al.
patent: 5961269 (1999-10-01), Krocker
patent: 6042623 (2000-03-01), Edwards
patent: 6071055 (2000-06-01), Tepman
patent: 6082950 (2000-07-01), Altwood et al.
patent: 6095741 (2000-08-01), Krocker et al.
patent: 6105454 (2000-08-01), Bacchi et al.
patent: 6315512 (2001-11-01), Tabrizi et al.
patent: 6318945 (2001-11-01), Hofmeister
patent: 6350097 (2002-02-01), Mitchell et al.
patent: 6395094 (2002-05-01), Tanaka et al.
patent: 6429139 (2002-08-01), Ryan et al.
patent: 6464448 (2002-10-01), Ha
patent: 6537415 (2003-03-01), Kojima et al.
patent: 6568552 (2003-05-01), Tabrizi et al.
patent: 6568896 (2003-05-01), Franklin et al.
patent: 6585470 (2003-07-01), Van Der Meulen
patent: 6610150 (2003-08-01), Savage et al.
patent: 6663333 (2003-12-01), Kinnard et al.
patent: 6675069 (2004-01-01), Uratani
patent: 6692219 (2004-02-01), Coomer et al.
patent: 6719517 (2004-04-01), Beaulieu et al.
patent: 6737826 (2004-05-01), Gilchrist
patent: 6748293 (2004-06-01), Larsen
patent: 6755092 (2004-06-01), Wakabayashi et al.
patent: 6893204 (2005-05-01), Suzuki et al.
patent: 2002/0006323 (2002-01-01), Yoshida et al.
patent: 2002/0033136 (2002-03-01), Savage et al.
patent: 2002/0131848 (2002-09-01), Kurata
patent: 2002/0137354 (2002-09-01), Timperio et al.
patent: 2002/0159864 (2002-10-01), Lowrance
patent: 2003/0035705 (2003-02-01), Johnson
patent: 2003/0108415 (2003-06-01), Hosek et al.
patent: 2003/0113187 (2003-06-01), Lei et al.
patent: 2004/0013497 (2004-01-01), Shirai
patent: 2004/0240971 (2004-12-01), Tezuka et al.
patent: 2006/0258128 (2006-11-01), Nunan et al.
File History for co-pending U.S. Appl. No. 10/919,582, filed Aug. 17, 2004, Publication No. 2006-0045664-A1.
File History for co-pending U.S. Appl. No. 11/622,361, filed Jan. 11, 2007, Publication No. 2007-0175864-A1.
Amendment E dated Oct. 8, 2008 for co-pending U.S. Appl. No. 10/919,582, filed Aug. 17, 2004.
Office Action dated Jan. 22, 2009 for co-pending U.S. Appl. No. 10/919,582, filed Aug. 17, 2004.
Amendment F and IDS dated Oct. 8, 2008 for co-pending U.S. Appl. No. 10/919,582, filed Aug. 17, 2004.
Office Action dated Nov. 26, 2008 for co-pending U.S. Appl. No. 11/622,361, filed Jan. 11, 2007.
Amendment A dated Mar. 10, 2009 for co-pending U.S. Appl. No. 11/622,361, filed Jan. 11, 2007.
Notice of Allowance dated Jun. 12, 2009 for co-pending U.S. Appl. No. 11/622,361, filed Jan. 11, 2007.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Advanced low cost high throughput processing platform does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Advanced low cost high throughput processing platform, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Advanced low cost high throughput processing platform will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4159784

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.