Acid Scavengers for use in chemically amplified photoresists

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

G03F 7039

Patent

active

057337055

ABSTRACT:
Proton sponge, berberine, and cetyltrimethyl ammonium hydroxide base compounds are used as additives to chemically amplified photoresists based on modified polyhydroxystyrene (PHS). The base additives scavenge free acids from the photoresist in order to preserve the acid labile moieties on the modified PHS polymer. The base additives are well suited to industrial processing conditions, do not react with the photoacid compounds in the photoresist composition to form byproducts which would hinder photoresist performance, and extend the shelf-life of the photoresist composition. In addition, the proton sponge and berberine base additives have a different absorption spectra than the modified PHS polymer, therefore, the quantity of base additive within the photoresist can be easily assayed and controlled.

REFERENCES:
patent: 4600683 (1986-07-01), Greco et al.
patent: 4612270 (1986-09-01), Pampalone et al.
patent: 4744834 (1988-05-01), Haq
patent: 4963463 (1990-10-01), Koshiba et al.
patent: 5210000 (1993-05-01), Thackeray et al.
patent: 5252435 (1993-10-01), Pourarian
patent: 5258257 (1993-11-01), Sinta et al.
patent: 5320931 (1994-06-01), Umehara et al.
patent: 5352564 (1994-10-01), Takeda et al.
patent: 5376498 (1994-12-01), Kajita et al.
patent: 5525432 (1996-06-01), Przybilla et al.
patent: 5609989 (1997-03-01), Bantu et al.
Terrier, et al., J. Org. Chem., 1986, 51, 409-410.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Acid Scavengers for use in chemically amplified photoresists does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Acid Scavengers for use in chemically amplified photoresists, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Acid Scavengers for use in chemically amplified photoresists will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-50508

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.