Acid-cleavable compounds, positive-working radiation-sensitive m

Details Acid-cleavable compounds, positive-working radiation-sensitive m Acid-cleavable compounds, positive-working radiation-sensitive m

1992-04-20

1994-02-15

Kight, III, John

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

528264, 528266, 430326, 430905, 560165, 560166, 564 60, 564153, C08G 1212

Patent

active

052866025

ABSTRACT:
Compounds having repeating units of the formula I ##STR1## in which R.sup.1 is an alkylene, cycloalkylene, alkenylene, alkynylene, or arylenebisalkyl group, in which one or more aliphatic CH.sub.2 groups may be replaced by oxygen or sulfur atoms,

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patent: 4247611 (1981-01-01), Sander et al.
patent: 4696888 (1987-09-01), Buhr
patent: 5037721 (1991-08-01), Doessel
Crivello, "Possibilities for Photoimaging Using Onium Salts", Polymer Engineering and Science, Mid-December, 1983, vol. 23, pp. 953-955.
Houlihan et al., "An Evaluation of Nitrobenzyl Ester Chemistry for Chemical Amplification Resists" SPIE, Advances in Resist Technology and Processing, 1988, vol. 920, pp 67-73.
Willson, "Organic Resist Materials-Theory and Chemistry", Introduction to Microlithography, 1983, pp. 88-159.

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