Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2005-11-08
2005-11-08
Thornton, Yvette C. (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S322000, C430S326000, C430S330000, C430S905000, C430S910000, C526S266000, C549S369000
Reexamination Certificate
active
06962767
ABSTRACT:
Acetal compounds in which a 5- or 6-membered ring acetal structure is connected to a norbornene structure through a linker represented by —(CH2)m— in which one hydrogen atom may be substituted with a hydroxyl or acetoxy group, and m is from 1 to 8 are novel. Using the acetal compounds as a monomer, polymers are obtained. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation and has excellent sensitivity, resolution, and etching resistance.
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Hasegawa Koji
Hatakeyama Jun
Kinsho Takeshi
Nakashima Mutsuo
Nishi Tsunehiro
Millen White Zelano & Branigan P.C.
Shin-Etsu Chemical Co. , Ltd.
Thornton Yvette C.
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