Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture – Nitrogen or nitrogenous component
Patent
1997-08-18
2000-08-22
Griffin, Steven P.
Chemistry of inorganic compounds
Modifying or removing component of normally gaseous mixture
Nitrogen or nitrogenous component
423240S, B01D 5354
Patent
active
061067903
ABSTRACT:
A process for destroying NF.sub.3 in a gas containing NF.sub.3 by contacting the gas with a fluidized bed of metal particles capable of reacting with NF.sub.3 wherein the metal particles have a particle size essentially no greater than approximately 300 microns. The process can be conducted in parallel connected switching fluidized beds wherein the beds are switched based upon achieving a predetermined bed height expansion based upon the reaction of the metal particles with the NF.sub.3.
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Shen, et al., Nanosize Silicon Whiskers Produced by Chemical Vapor Deposition: Active Getter for NF3, Chemistry of Materials, (1995), vol. 7, pp. 961-968.
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Vileno, et al., Thermal Decomposition of NF3 by Ti, Si, and Sn Powders, Chemistry of Materials, (1995) vol. 7, pp. 683-687.
Hsiung Thomas Hsiao-Ling
Withers, Jr. Howard Paul
Air Products and Chemicals Inc.
Chase Geoffrey L.
DiMauro Peter
Griffin Steven P.
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