Abatement of NF.sub.3 using small particle fluidized bed

Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture – Nitrogen or nitrogenous component

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423240S, B01D 5354

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active

061067903

ABSTRACT:
A process for destroying NF.sub.3 in a gas containing NF.sub.3 by contacting the gas with a fluidized bed of metal particles capable of reacting with NF.sub.3 wherein the metal particles have a particle size essentially no greater than approximately 300 microns. The process can be conducted in parallel connected switching fluidized beds wherein the beds are switched based upon achieving a predetermined bed height expansion based upon the reaction of the metal particles with the NF.sub.3.

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Shen, et al., Nanosize Silicon Whiskers Produced by Chemical Vapor Deposition: Active Getter for NF3, Chemistry of Materials, (1995), vol. 7, pp. 961-968.
Vileno, et al., Thermal Decomposition of NF3 with Various Oxides, Chemistry of Materials, (1996) vol. 8, pp. 1217-1221.
Vileno, et al., Thermal Decomposition of NF3 by Ti, Si, and Sn Powders, Chemistry of Materials, (1995) vol. 7, pp. 683-687.

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