4. Chemistry of inorganic compounds
  5. Modifying or removing component of normally gaseous mixture
  6. Nitrogen or nitrogenous component

Howard Paul Withers, Jr.

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Abatement of F2 using small particle fluidized bed

Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture – Halogenous component
Reexamination Certificate

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Abatement of NF.sub.3 using small particle fluidized bed

Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture – Nitrogen or nitrogenous component
Patent

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Abatement of NF.sub.3 with metal oxalates

Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture – Nitrogen or nitrogenous component
Patent

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On-line UV-Visible light halogen gas analyzer for...

Radiant energy – Invisible radiant energy responsive electric signalling – Ultraviolet light responsive means
Reexamination Certificate

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Organosilicon precursors for interlayer dielectric films...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate

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