A method of image-wise exposing and developing halogen-containin

Details A method of image-wise exposing and developing halogen-containin A method of image-wise exposing and developing halogen-containin

1987-11-23

1989-04-18

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430270, 430322, 430323, 430326, 522152, 522153, 5262921, 526245, 526246, 560145, 560210, 524545, 524566, G03C 500

Patent

active

048227218

ABSTRACT:
Halogen-containing polyacrylate derivatives having the formula: ##STR1## wherein A is a structural unit derived from a copolymeriazable monomer having a double bond; R is ##STR2## wherein each of R.sub.1 and R.sub.2 is a hydrogen atom or a fluorinated methyl group, provided R.sub.1 and R.sub.2 are not hydrogen atoms at the same time, and R.sub.3 is a hydrogen atom or a lower alkyl group; X is a halogen atom or a methyl group; and m is a positive integer, n is 0 or a positive integer, and n/m from 0 to 2, preferably from 0 to 1 are disclosed.
Also disclosed are methods for forming a resist pattern by using the halogen-containing polyacrylate derivatives as a resist material.

REFERENCES:
patent: 3544535 (1970-12-01), Gilbert et al.
Patent Abstracts of Japan, vol. 7, No. 160 (P-210)[1305], Jul. 14, 1983.
Derwents' English Abstracts of References AL, AM and An.

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