8-mirror microlithography projection objective

Details 8-mirror microlithography projection objective 8-mirror microlithography projection objective

2008-05-13

2008-05-13

Nguyen, Thong Q (Department: 2872)

Optical: systems and elements

Compound lens system

With curved reflective imaging element

C359S858000, C359S361000, C355S071000, C378S034000

Reexamination Certificate

active

11592065

ABSTRACT:
A projection objective provides a light path for a light bundle from an object field in an object plane to an image field in an image plane. The projection objective includes eight mirrors. The light path is provided via the eight mirrors, and is free of obscuration.

REFERENCES:
patent: 5153898 (1992-10-01), Suzuki et al.
patent: 5315629 (1994-05-01), Jewell et al.
patent: 5686728 (1997-11-01), Shafer
patent: 5815310 (1998-09-01), Williamson
patent: 6033079 (2000-03-01), Hudyma
patent: 6353470 (2002-03-01), Dinger
patent: 6556648 (2003-04-01), Bal et al.
patent: 6710917 (2004-03-01), Mann et al.
patent: 6750948 (2004-06-01), Omura
patent: 7177076 (2007-02-01), Mann et al.
patent: 0480617 (1996-09-01), None
patent: 0779528 (1997-06-01), None
patent: 0947882 (1999-10-01), None
patent: 0252734 (2000-05-01), None
patent: WO 99/57606 (1999-11-01), None

Affiliated with

Also associated with

Rating

8-mirror microlithography projection objective does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with 8-mirror microlithography projection objective, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and 8-mirror microlithography projection objective will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3942223