Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2002-10-22
2008-01-08
Lee, Sin (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S325000, C430S326000, C430S330000, C430S942000, C430S905000, C430S910000, C526S266000, C526S270000, C549S263000, C549S264000, C549S295000, C549S296000, C549S323000, C549S324000, C549S326000
Reexamination Certificate
active
07316884
ABSTRACT:
A 5-methylene-1,3-dioxolan-4-one derivative and a monomer and copolymer thereof and a resist composition containing the polymer or copolymer where the 5-methylene-1,3 -dioxolan-4-one derivative is of formula (1):wherein R1represents a bridged cyclic hydrocarbon group containing 4 to 16 carbon atoms, or a linear or branched alkyl group containing 1 to 6 carbon atoms which has a bridged cyclic hydrocarbon group containing 4 to 16 carbon atoms as a substituent; R2represents a hydrogen atom, or a linear or branched alkyl group containing 1 to 6 carbon atoms; or R1and R2represent a bridged cyclic hydrocarbon group containing 4 to 16 carbon atoms together with the carbon atom to which they are bound, provided that the alkyl group and the bridged cyclic hydrocarbon group may have at least one substituent selected from a group consisting of a linear or branched alkyl group containing 1 to 6 carbon atoms which may be optionally substituted, a hydroxy group, a carboxy group, an acyl group containing 2 to 6 carbon atoms, an alkoxy group containing 1 to 6 carbon atoms, and a carboxy group esterified with an alcohol containing 1 to 6 carbon atoms.
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Ansai Ryuichi
Fujiwara Tadayuki
Kamon Yoshihiro
Kuwano Hideaki
Momose Hikaru
Lee Sin
Mitsubishi Rayon Co. Ltd.
Oblon & Spivak, McClelland, Maier & Neustadt P.C.
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