4. Etching a substrate: processes
  5. Gas phase etching of substrate
  6. Application of energy to the gaseous etchant or to the...
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Hung Hoiman (Raymond)

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Hwang Jeng

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Ibi Koji

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Ikeda Tetsu

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Inazawa Koichiro

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Internuiversitair Microelektronica Centrum

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Itoh Masamitsu

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Japan as represented by the Director General of the Agency of In

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Jarecki, Jr. Robert L.

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Jim Mitzel

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Jin Guangxiang

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Jones John

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Kanbara Hiromitsu

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Kaneko Kazuaki

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Kaufman Kimberley A.

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Kava Joseph

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Kawaguchi Mark N.

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Kazumi Hideyuki

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Keil Mark

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Keswick Peter

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