4. Chemistry: electrical and wave energy
  5. Apparatus
  6. Coating, forming or etching by sputtering
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Osaka Vacuum Chemical Co., Ltd.

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Osborne Norman

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Oshima Yoshihiro

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Osmotek Inc.

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Otuka Sigeharu

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Oyamada Takeshi

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Pace Salvatore J.

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Palmer Keith A.

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Panayotov Stoyan Y.

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Pandhumsoporn Tamarak

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Pandumsoporn Tamarak

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Pang Joseph

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Papp Andrew

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Parent Scott R.

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Parfeniuk Christopher L.

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Park Man-Jong

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Park Se-Geun

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Park Young-Kyou

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Pasternack George I.

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Patadia Nalin

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