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Abatement of F2 using small particle fluidized bed

Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture – Halogenous component
Reexamination Certificate

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Abatement of fluorine gas from effluent

Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture – Halogenous component
Reexamination Certificate

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Abatement system for ClF3 containing exhaust gases

Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture – Halogenous component
Patent

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Absorbents

Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture – Halogenous component
Reexamination Certificate

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Adsorbent for and method of removing iodine compounds

Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture – Halogenous component
Patent

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Adsorbent for recovery of bromine and bromine-recovering process

Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture – Halogenous component
Patent

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Alteration of the character of hydrogen fluoride droplets render

Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture – Halogenous component
Patent

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Apparatus and process for the abatement of semiconductor...

Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture – Halogenous component
Reexamination Certificate

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Apparatus for treating a gas stream

Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture – Halogenous component
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