Abatement system for ClF3 containing exhaust gases

Details Abatement system for ClF3 containing exhaust gases Abatement system for ClF3 containing exhaust gases

1998-06-02

2000-05-09

Nguyen, Ngoc-Yen

Chemistry of inorganic compounds

Modifying or removing component of normally gaseous mixture

Halogenous component

423241, B01D 5334

Patent

active

060600349

ABSTRACT:
A process for the abatement of a ClF.sub.x containing gas such as exhaust gases from a reactor wherein at least one step of the manufacture of integrated circuit is carried out, wherein the ClF.sub.x containing gas is passed through a bed of adsorbent comprising sodalime having a moisture content of less than 3% by weight, to substantially remove all of the ClF.sub.x compound from the ClF.sub.x containing gas with substantially no generation of byproducts.

REFERENCES:
patent: 5094825 (1992-03-01), Mori
patent: 5378444 (1995-01-01), Akita et al.

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