Apparatus and process for the abatement of semiconductor...

Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture – Halogenous component

Reexamination Certificate

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Reexamination Certificate

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06905663

ABSTRACT:
Apparatus and process for the abatement of fluorine and fluorine-containing compounds from gases containing same, such as effluent gas streams from semiconductor manufacturing operations, wherein a fluorocompound abatement medium is injected into the fluorocompound-containing gas. The fluorocompound abatement medium comprises at least one of steam, methane and hydrogen, with the proviso that when the fluorocompound abatement medium contains methane and/or hydrogen, the injection of the fluorocompound abatement medium is conducted under non-combustion conditions.

REFERENCES:
patent: 3813852 (1974-06-01), Steineke
patent: 5238656 (1993-08-01), Tajima et al.
patent: 5759237 (1998-06-01), Li et al.
patent: 2001/0001652 (2001-05-01), Kanno et al.
patent: 4319118 (1994-12-01), None
patent: 4321762 (1995-01-01), None
patent: 0412456 (1991-02-01), None
patent: 0885648 (1998-12-01), None
patent: 1129775 (2001-09-01), None
Landau, R., Rosen, R.,Industr. Eng. Chem., 39, pp. 281-286 (1974).
Turnbull, S.G., Benning, A.F., Feldmann, G.W., Linch, A.L., McHarness, R.C., Richards, M.K.,Industr. Eng. Chem., 39, pp. 286-288 (1947).
Slabey, V.A., Fletcher, E.A., National Advisory Committee for Aeronautics, Technical Note 4374, 1958.
Smiley, et al. “Continuous Disposal of Fluorine”, Industrial and Engineering Chemistry, 1954, vol. 46, No. 2, pp. 244-247.
Streng, A.G., “The Fluorine-Steam Flame and its Characteristics”, Jun. 1962, pp. 89-71.
Langan, J., Maroulis, J., and Ridgewa, R., Solid State Technology, “Strategies for greenhouse gas reduction” Jul. (1996), 115.
J.T. Holmes et al., I&EC Process Design and Development, vol. 6, No. 4, p. 408, 413, (1967).
Cady, G.H.J.J. Am. Chem. Soc., 57, 246 (1935).
Smiley, S.H. and Schmitt, C.R. Ind. Eng. Chem., 46, p. 244 (1954).
Streng A.G. Combustion Flame, 6, p. 89 (1962).

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