4. Coating apparatus
  5. Gas or vapor deposition
  6. Work support

Sadayuki Fujishima

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Rotary substrate processing apparatus and method

Coating apparatus – Gas or vapor deposition – Work support
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Substrate processing method and substrate processing system

Cleaning and liquid contact with solids – Apparatus – Automatic controls
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Substrate processing method and substrate processing system

Cleaning and liquid contact with solids – Processes – With treating fluid motion
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Profile ID: LFUS-PAI-P-2754945

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