Cleaning and liquid contact with solids – Apparatus – Automatic controls
Reexamination Certificate
2006-01-31
2006-01-31
Kornakov, M. (Department: 1746)
Cleaning and liquid contact with solids
Apparatus
Automatic controls
C134S0570DL, C134S098100, C134S107000, C134S108000, C134S902000, C438S905000
Reexamination Certificate
active
06990988
ABSTRACT:
A liquid processing system of the present invention controls a temperature of a processing liquid being in a stand-by circulation line by control means for controlling the heaters to heat the processing liquid stored in the tank, while controlling the opening/closing means to pass the cooling medium into the tank with the stored processing liquid.
REFERENCES:
patent: 6148909 (2000-11-01), Osanai et al.
patent: 6478035 (2002-11-01), Niuya et al.
patent: 6589338 (2003-07-01), Nakamori et al.
patent: 6663721 (2003-12-01), Egashira et al.
patent: 2001/0013555 (2001-08-01), Egashira et al.
patent: 2003/0159716 (2003-08-01), Nagai et al.
patent: 6-124934 (1994-05-01), None
patent: 10-209125 (1998-08-01), None
patent: 2000-283050 (2000-10-01), None
patent: 2001-266215 (2001-09-01), None
Kornakov M.
Morrison & Foerster / LLP
Tokyo Electron Limited
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