Image formation method with a post exposure heating step

Details Image formation method with a post exposure heating step Image formation method with a post exposure heating step

1997-07-09

1999-06-01

Duda, Kathleen

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430302, 430330, 430945, G03C 556

Patent

active

059087340

ABSTRACT:
An image formation method which comprises: (a) selectively exposing a photosensitive layer with a visible laser beam, (b) heating the exposed photosensitive layer at a temperature of from 36 to 48.degree. C. for 10 seconds to 3 minutes, and (c) developing the photosensitive layer.

REFERENCES:
patent: 4877719 (1989-10-01), Higashi et al.
patent: 5227281 (1993-07-01), Gaschler et al.

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