Polymer compositions for high resolution resist applications

Details Polymer compositions for high resolution resist applications Polymer compositions for high resolution resist applications

1996-09-23

1999-06-01

Hamilton, Cynthia

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Electron beam imaging

430326, 430966, 430967, 430942, G03F 730, G03F 732, G03F 738

Patent

active

059087323

ABSTRACT:
Positive lithographic patterns are produced by imagewise exposing to actinic light, x-ray or e-beam copolymers of 2-hydroxyalkyl methacrylate and/or 2-hydroxyalkyl acrylate with alkylmethacrylate and/or alkylacrylate, and then developing the polymer in a developer.

REFERENCES:
patent: 4262082 (1981-04-01), Rosenkranz
patent: 5506088 (1996-04-01), Nozaki et al.
Sharma et al, Polymer,1984, vol. 25, Aug. 1984 pp. 1090-1092.
RN 25249-16-5, Registry Copyright 1997 ACS, Computer printout, 1 page.
Bohumil Bednar et al, Resists in Microlithography and Printing, Materials Science Monographs: 76, 2nd revised Ed, Elsevier, Amsterdam, 1993, pp. 84-86.

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