Phenolic novolak resin compositions containing 5-indanol and the

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface

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430165, 430191, 430192, 430193, G03F 730, G03F 7023

Patent

active

053386531

ABSTRACT:
A phenolic novolak resin composition comprising a condensation product of at least one aldehyde source with a phenolic source comprising 5-indanol. Said phenolic novolak resins are used in radiation-sensitive compositions, especially those useful as positive-working photoresists.

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