Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent
1994-02-09
1994-08-16
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
430165, 430191, 430192, 430193, G03F 730, G03F 7023
Patent
active
053386531
ABSTRACT:
A phenolic novolak resin composition comprising a condensation product of at least one aldehyde source with a phenolic source comprising 5-indanol. Said phenolic novolak resins are used in radiation-sensitive compositions, especially those useful as positive-working photoresists.
REFERENCES:
patent: 3442893 (1969-06-01), Lynch
patent: 3716359 (1974-06-01), Hall
patent: 3759898 (1973-09-01), Nakanishi
patent: 3832381 (1974-08-01), Taylor et al.
patent: 3876562 (1975-04-01), Hall
patent: 3985930 (1976-10-01), Shackle
patent: 4366328 (1992-12-01), Numata et al.
patent: 4418220 (1983-11-01), Numata et al.
patent: 4920028 (1990-04-01), Lazarus et al.
patent: 4943511 (1990-07-01), Lazarus et al.
patent: 4948864 (1990-08-01), Imai et al.
patent: 5250653 (1993-10-01), Toukhy
CA75(2):6802h-Antioxidants & Stabilizers (1990 American Chemical Society).
CA70(24):107209x-Use of Porapak type Czechoslovakian Organic Polymer in Thin-Layer (1990 American Chemical Society).
CA68(20):92769n-Application of Porous Ethylvinylbenzene Polymers to Thin-Layer Chromatography (1990 American Chemical Society).
Bowers Jr. Charles L.
Chu John S.
OCG Microelectronic Materials Inc.
Simons William A.
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