Process and apparatus for plasma treatment

Details Process and apparatus for plasma treatment Process and apparatus for plasma treatment

1986-08-19

1988-01-12

Massie, Jerome

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156345, 156646, 20419232, 204298, 239390, 239515, C23C 1422, C23C 1400, C23F 100, C23F 108

Patent

active

047189762

ABSTRACT:
A process and apparatus for plasma treatment by the use of a plasma generating chamber and a separate treating chamber in which an activated gas, excited in the plasma generating chamber, is introduced into the treating chamber, distributed within the treating chamber by a gas diffusing plate, and then is brought into contact with a material to be treated.

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Vossen et al., Ed., Thin Film Processes Academic Press New York, N.Y. (1978) pp. 533-534.
Nordine et al., "Heterogeneous . . . Construction" AiAA Journal, vol. 14, No. 5, (1976) pp. 644-647.
Dzioba et al., "Decapsulation . . . Plasmas", J. of Electrochem Soc: Solid-State Sci and Tech., vol. 129, No. 11 (11/82) pp. 2537-2541.
Flamm et al., "XeF.sub.2 . . . Etching" Solid State Technologies (4183) pp. 117-121.
Patent Abstracts of Japan, vol. 3, No. 123(C-61), Oct. 16, 1979.

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