Process for forming photoresist images

Details Process for forming photoresist images Process for forming photoresist images

1983-04-12

1985-07-09

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430271, 430273, 430309, 430326, G03C 1495, G03C 500

Patent

active

045282625

ABSTRACT:
A process for forming photoresist images by sticking photosensitive layer formed on a film of a polyvinyl alcohol resin which is not soluble in water, but is swellable with water, to a substrate, exposing the photosensitive layer to light through the polyvinyl alcohol resin film, washing away the polyvinyl alcohol resin film with water and developing the photosensitive layer with a developer.

REFERENCES:
patent: 3458311 (1969-07-01), Alles
patent: 4268601 (1981-05-01), Namiki et al.
patent: 4301230 (1981-11-01), Taguchi et al.
patent: 4469775 (1984-09-01), Lynch et al.
Kirk-Othmer, Encylopedia of Chemical Technology, vol. 21, pp. 353-357, 1970.

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