Photo-encoded selective etching for glass based microtechnology

Details Photo-encoded selective etching for glass based microtechnology Photo-encoded selective etching for glass based microtechnology

1996-10-16

1999-07-06

Ford, John M.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430 5, 430321, 216 24, G11B 700, G03C 500

Patent

active

059196076

ABSTRACT:
Two-photon excitation of charge carriers in boron E'-center containing borosilicate glasses is shown to result in a photo-encoding of selectively etchable regions. Using a turbulent process followed by polishing, a number of patterning capabilities for microtechnology applications are achieved, such as ultra-fast capillary electrophoresis chips and rapid prototyping of diffractive optical elements.

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