Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1997-12-09
1999-07-27
Baxter, Janet
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430919, 430921, G03C 1492
Patent
active
059288370
ABSTRACT:
Proposed is a novel negative-working chemical-sensitization photoresist composition used in the photolithographic patterning work for the manufacture of semiconductor devices and the like and capable of giving a patterned resist layer with high sensitivity and pattern resolution as well as excellent heat resistance and excellently orthogonal cross sectional profile of the patterned resist layer. The composition comprises, as a uniform solution:
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Ishikawa Kiyoshi
Komano Hiroshi
Sato Mitsuru
Sugeta Yoshiki
Tachikawa Toshikazu
Ashton Rosemary
Baxter Janet
Tokyo Ohka Kogyo Co. Ltd.
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