Method of making a semiconductor device

Details Method of making a semiconductor device Method of making a semiconductor device

1996-08-09

1999-12-14

Niebling, John F.

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

Having insulated gate

438197, 438199, 438238, 438652, 438657, 438634, 438684, 438671, 438672, H01L 218242

Patent

active

06001685&

ABSTRACT:
A method of making a semiconductor device having a structure capable of obtaining an increased alignment margin for a mask without any increase in the area of the semiconductor device is shown by forming a contact plug on a drain while forming a contact pad on a source, without forming contact plugs on both the source and the drain in a simultaneous manner. The contact pad has an upper portion partially overlapping with a portion of an insulating film surrounding a contact hole in which the contact pad is buried. Accordingly, it is possible to easily carry out the contact process.

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1990, IBM Technical Disclosure Bulletin, vol. 33, No. 2, Jul. 1990; pp. 245-247.

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