Coating apparatus – Gas or vapor deposition – Work support
Patent
1994-10-20
1999-01-05
Breneman, R. Bruce
Coating apparatus
Gas or vapor deposition
Work support
118725, 118728, 118730, 118719, 118500, 118503, 156345, 20429811, C23C 1600, C23C 1400, C23F 100, H01L 2100
Patent
active
058556877
ABSTRACT:
Apparatus for CVD processing wherein a wafer mounted on a vertically movable susceptor beneath a showerhead. The susceptor extends beyond the outer perimeter of the wafer such that, when the susceptor is raised into contact with a shield ring which normally rests on a ring support in the chamber, the shield ring engages outer portion of the susceptor beyond the perimeter of the wafer, lifting the shield ring off its support. The shield ring shields the edge of the top surface of the susceptor during the deposition, whereby unwanted deposition on the susceptor is prevented while, at the same time, allowing for deposition over the entire upper surface of the wafer. To center the shield ring and the susceptor with respect to each other, the shield ring may include a plurality of centering protrusions, at least some of which engage the susceptor as it moves upwards to lift the shield ring off its supports in the chamber.
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Chang Mei
DuBois Dale R.
Marsh Richard A.
Morrison Alan F.
Applied Materials Inc.
Breneman R. Bruce
Lund Jeffrie R.
Mulcahy Robert W.
Opperman, Esq. Craig P.
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