Method of forming a channel

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

430324, 430325, 430326, 430394, 372 48, 372 96, G03C 500

Patent

active

048450146

ABSTRACT:
A method of forming a variable width channel in a body comprises the steps of forming a surface grating having a photoresist layer thereon. The photoresist layer has a plurality of depressions and a planar photomask is then positioned over the photoresist layer. The photoresist layer is subsequently exposed and developed and due to the divergence of light into the depressions covered by the photomask, forms a variable width opening. A portion of the body exposed in the opening is removed to form a channel with a sidewall having a surface contour corresponding to an edge of the opening.

REFERENCES:
patent: 2854336 (1958-09-01), Gutknecht
patent: 3669673 (1972-06-01), Chung Sen Ih et al.
patent: 4023993 (1977-05-01), Scifres et al.
patent: 4099999 (1978-07-01), Burnham et al.
patent: 4251780 (1981-02-01), Scifres et al.
patent: 4302729 (1981-11-01), Burnham et al.
patent: 4359776 (1982-11-01), Acket et al.
patent: 4369513 (1983-01-01), Umeda et al.
Abita, Joseph L. "Improved Conventional Photolithography by Relief Mask Processing", Solid State Technology, pp. 48-49, Jun. 1974.
D. Marcuse, Light Transmission Optics, Chapter 2, "Diffraction Theory", Van Nostrand Reinhold Company, 1972, pp. 30-31.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method of forming a channel does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of forming a channel, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of forming a channel will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-851959

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.