Method of forming positive images through organometallic treatme

Details Method of forming positive images through organometallic treatme Method of forming positive images through organometallic treatme

1991-02-11

1992-01-07

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430313, 430327, 430330, 430325, 156628, G03C 500, G03C 516

Patent

active

050791311

ABSTRACT:
The present invention is directed to negative cross-linking photoresist formulations containing nonphotoactive cross-linking agents, such as, but not limited to, the CYMEL 300 series, and to the use of these formulations specifically for the dry development of the so-treated resists as positive tone images following their vapor phase treatment with suitable organometallic materials, e.g., HMDS.

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patent: 4921778 (1990-05-01), Thackeray et al.
Visser et al, "Mechanism and Kinetics of Silybation of Resist Layers . . . ", Proceedings of SPIE, vol. 771, 1987, p. 1-7.

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