Method for etching titanium nitride local interconnects

Details Method for etching titanium nitride local interconnects Method for etching titanium nitride local interconnects

1988-03-29

1989-11-07

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156646, 156656, 1566591, 156667, 20419235, 20419237, 427 38, C23F 102, B44C 122, C03C 1500, H01L 21306

Patent

active

048789941

ABSTRACT:
A process for the etching of titanium containing film which utilizes both in situ and remote plasmas, and a gas mixture for the plasmas which comprises a halogen gas at low pressure and moderate temperature to produce an etch which is both selective to selected materials, for example, titanium silicide etc., and anisotropic.

REFERENCES:
patent: 4673456 (1987-06-01), Spencer et al.
patent: 4687544 (1987-08-01), Bersin

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