Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Forming nonplanar surface
Patent
1978-11-09
1981-03-03
Kimlin, Edward C.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Forming nonplanar surface
430252, 430306, 430270, 430907, 430331, C03C 500
Patent
active
042542111
ABSTRACT:
Transfer material is prepared by applying to a substrate a layer of a photosensitive material which is insoluble but swellable in the solvent used to develop the image and whose adhesion to the substrate increases on exposure to light, imagewise exposing the material and developing the so-exposed material by treatment with a solvent fully to remove unexposed material from the substrate and, if necessary, treating the remaining areas of the exposed material to render them transferable from the substrate. In this manner the full thickness of the photosensitive material layer may be retained in the final transfer material. In particular, adhesive material may be applied to the layer photosensitive material before imagewise exposure, and the adhesive coated material imagewise exposed and developed to remove photosensitive material and adhesive in the non-exposed areas only to leave adhesive coated image indicia.
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Marwick William F. G.
Scrutton Simon L.
Wilson David R.
Kimlin Edward C.
Letraset USA Inc.
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