Apparatus for effecting alignment and spacing control of a mask

Details Apparatus for effecting alignment and spacing control of a mask Apparatus for effecting alignment and spacing control of a mask

1982-08-04

1984-09-18

Smith, Alfred E.

X-ray or gamma ray systems or devices

Specific application

Lithography

2504911, 378205, G02B 2700, H01L 2130

Patent

active

044728247

ABSTRACT:
This invention relates to apparatus for effecting alignment and spacing control of a mask and wafer for use, for example, in x-ray lithography, which includes, in combination, two optical channels for effecting lateral and vertical alignment at two spaced alignment targets respectively on the element, two spaced position sensors located on a line which is oblique with respect to a line joining the two alignment targets, and linkage for maintaining the distances between the position sensors and the element equal one to the other.

REFERENCES:
patent: 4335313 (1982-06-01), Kreuzer et al.

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