Photolithographically patterned fluorescent coating

Details Photolithographically patterned fluorescent coating Photolithographically patterned fluorescent coating

1991-06-17

1994-03-29

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Electron beam imaging

430322, 430325, 430326, G03C 556

Patent

active

052983633

ABSTRACT:
Fluorescent patterns are provided registratively oriented on a support by coating a liquid precursor of a photolithographically patternable composition, containing fluorescent compounds, on said support and patternwise exposing and developing the coating on the support.

REFERENCES:
patent: 4262206 (1981-04-01), Viehmann
patent: 4577098 (1986-03-01), Ogawa
patent: 4605489 (1986-08-01), Madgavkar
patent: 4743530 (1988-05-01), Farid
patent: 4906552 (1990-03-01), Ngo
Viehmann et al, SPIE vol. 279, "Ultraviolet and Vacuum Ultraviolet Systems" pp. 146-152 (1981).
Stuart et al, SPIE vol. 331, "Instrumentation in Astronomy IV" pp. 52-68 (1982).

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