Etching of copper-containing devices

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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156664, 252 793, H01L 2100

Patent

active

052981177

ABSTRACT:
The linewidth in patterns produced by etching copper layers is more easily maintained using a specific etching medium. In particular, this medium includes aqueous hydrofluoric acid, copper chloride, and an additional chloride salt. The etching medium is also particularly useful for bilayer metal constructions such as the copper/titanium structure found in many multichip modules.

REFERENCES:
patent: 4220706 (1980-09-01), Spak
patent: 4345969 (1982-08-01), James et al.
G. Messner et al. Thin Film Multichip Modules, International Society for Hybrid Microelectronics, Reston, Va., 1992.
R. Clark, Handbook of Printed Circuits, Van Nostrand Reinhold, N.Y., 1985.

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